Method for roughening the surface of a silicon substrate, roughened substrate and photovoltaic cell comprising a roughened substrate

摘要

A surface of a silicon substrate is roughened without using a substance harmful to the environment, and the reflectance of the surface is reduced. The present invention relates to a method for roughening a surface of a silicon substrate, wherein a bias is applied between 100 V and 300 V in a matrix-dispersed electron cyclotron resonance plasma, and 1.5 W / cm 2 and 6.5 W / cm 2. And exposing the surface to the MDECR with at least a plasma power of at least Ar. [Selection] Figure 2