Forming a fine pattern for the radiation-curable resin composition , and a method of manufacturing a microstructure using said composition

摘要

PROBLEM TO BE SOLVED: To realize a simple method of manufacturing a fine structure, that collectively forms a fine pattern on a large sized base material while having a high throughput, in a method of forming the fine pattern by irradiation with radiation, and to provide a radiation curable resin composition for forming a fine pattern, capable of obtaining a uniform painted film producing no interference fringe after forming the pattern.;SOLUTION: This radiation curable resin composition has: a radiation-sensitive curable polymer (P) having an alkylene group, an arylene group, -COO-, and the like, and a unit comprising a radiation curable functional group, a cyclic ether group, and the like; a radiation curable monomer (M); and a radiation polymerization initiator (I). The rate of the radiation-sensitive curable polymer (P) to a total quantity of radiation curable components in the composition is 55-95 wt.%, and the rate of the radiation curable monomer (M) is 5-45 wt.%.;COPYRIGHT: (C)2012,JPO&INPIT