首页> 外国专利> MODIFIED HYDROGENATED POLYSILOXAZANE, COMPOSITION COMPRISING SAME FOR FORMING SILICA-BASED INSULATION LAYER, METHOD FOR PREPARING COMPOSITION FOR FORMING SILICA-BASED INSULATION LAYER, SILICA-BASED INSULATION LAYER, AND METHOD FOR PREPARING SILICA-BASED INSULATION LAYER

MODIFIED HYDROGENATED POLYSILOXAZANE, COMPOSITION COMPRISING SAME FOR FORMING SILICA-BASED INSULATION LAYER, METHOD FOR PREPARING COMPOSITION FOR FORMING SILICA-BASED INSULATION LAYER, SILICA-BASED INSULATION LAYER, AND METHOD FOR PREPARING SILICA-BASED INSULATION LAYER

机译:改性的氢化聚硅氧氮烷,用于形成基于二氧化硅的绝缘层的组成相同的成分,用于形成基于二氧化硅的绝缘层的成分的制备方法,基于二氧化硅的绝缘层以及用于制备二氧化硅的层的方法

摘要

Disclosed is modified hydrogenated polysiloxazane prepared by reacting hydrogenated polysiloxazane with a silane compound selected from polysilane, polycyclosilane, and a silane oligomer. The modified hydrogenated polysiloxazane has a small mole ratio of nitrogen atoms relative to silicon atoms and may remarkably deteriorate a film shrinkage ratio when included in a composition for forming a silica-based insulation layer to form a silica-based insulation layer.
机译:公开了通过使氢化聚硅氧氮烷与选自聚硅烷,聚环硅烷和硅烷低聚物的硅烷化合物反应制备的改性氢化聚硅氧氮烷。所述改性氢化聚硅氧杂氮烷具有相对于硅原子的氮原子摩尔比小且当包含在用于形成基于二氧化硅的绝缘层以形成基于二氧化硅的绝缘层的组合物中时,可显着降低膜的收缩率。

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