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Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing device
Measurement apparatus to calculate wavefront aberration of optical system using shearing interference fringes, exposure apparatus, and method of manufacturing device
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机译:利用剪切干涉条纹计算光学系统的波前像差的测量装置,曝光装置和制造装置
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摘要
A measurement apparatus comprises: a light source; a first optical system configured to reflect a certain component of a light beam emitted by the light source by a final surface thereof and transmit a remaining component of the light beam; a reflecting surface configured to reflect the remaining component; an optical member configured to generate a first shearing interference fringe formed by the certain component, and a second shearing interference fringe formed by the remaining component; an image sensing unit configured to simultaneously sense the first and second shearing interference fringes generated by the optical member; and an arithmetic unit configured to calculate, a wavefront aberration of the first optical system and a wavefront aberration of the first optical system and an optical system to be measured, using data on the first and second shearing interference fringes, thereby calculating a wavefront aberration of the optical system to be measured.
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