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Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
Optical arrangement in a projection objective of a microlithographic projection exposure apparatus
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机译:微光刻投影曝光设备的投影物镜中的光学布置
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摘要
The disclosure relates to an optical arrangement in a projection objective of a microlithographic projection exposure apparatus which is designed for operation in EUV. The optical arrangement includes first and second mirrors that are in direct succession to each other along the projection beam direction. The second mirror is rigidly connected to the first mirror.
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