首页>
外国专利>
Static timing analysis method and system considering capacitive coupling and double patterning mask misalignment
Static timing analysis method and system considering capacitive coupling and double patterning mask misalignment
展开▼
机译:考虑电容耦合和双图形掩模失准的静态时序分析方法和系统
展开▼
页面导航
摘要
著录项
相似文献
摘要
A method for analyzing an IC design, comprises: using a computer implemented electronic design automation tool to perform a parasitic RC extraction for a layout of the IC design, the parasitic RC extraction outputting for each of a plurality of routing paths, a nominal capacitive coupling, a minimum capacitive coupling and a maximum capacitive coupling, where the minimum and maximum capacitive couplings correspond to circuit patterning in the presence of double patterning mask misalignments; and performing one of a setup time analysis or a hold time analysis of the IC design using a computer implemented static timing analysis tool. For a given flip-flop having a launch path and a capture path, the setup or hold time analyses is performed using the minimum capacitive coupling for one of the launch and capture paths and the maximum capacitive coupling for the other of the launch and capture paths.
展开▼