首页> 外国专利> a cooling system u043cu0430u0433u043du0435u0442u0440u043eu043du043du043e - u0440u0430u0441u043fu044bu043bu0438u0442u0435u043bu044cu043du043eu0433u043e cylindrical type device

a cooling system u043cu0430u0433u043du0435u0442u0440u043eu043du043du043e - u0440u0430u0441u043fu044bu043bu0438u0442u0435u043bu044cu043du043eu0433u043e cylindrical type device

机译:冷却系统 u043c u0430 u0433 u043d u0435 u0442 u0440 u043e u043d u043d u043d u043e- u0440 u0430 u0441 u043f u044b u043b u0438 u0442 u0435 u043b u043c u043c u043d u043e u0433 u043e圆柱型设备

摘要

the invention relates to a plasma technology and is designed for vacuum ion plasma coating of thin films of metals, semiconductors, and density and x compounds on the surface of solid bodies.the technical result is the productivity u043cu0430u0433u043du0435u0442u0440u043eu043du043du043eu0439 spray system of cylindrical type process, to ensure the complete removal of'm cooling with the refrigerant and simplify the design u043cu0430u0433u043du0435u0442u0440u043eu043du0430.the system contains the node 1 to the vacuum chamber, the supply and drain channels which are 2 to 3 cooling liquid and compressed air, the motor 4, u0440u0435u043cu0435u043d noah drive rotation of 15 u0440u0430u0441u043fu044bu043bu0438u0442u0435u043bu044cu043du043eu0433u043e block 7, the cylindrical target 5, 6 with a drive control system of a belt 17, lagrange support pipes 8 with the magnetic systemthe front 10 and the flange 11 of the target with rubber means 12. the flange 11 contains a radial hole 13, united with the fixed support pipe 8.the front flange 10 of a target 5 additionally contains radial openings 14, with the radial openings of the front and rear flanges 10, 11 connected and the target are cross cutting in the direction of forming the flanges of their central axis and connected with the channels 2, 3 supply and exhaust the coolant.control system with drive speed control system 6 includes 16 speed of rotation and fixation u0440u0430u0441u043fu044bu043bu0438u0442u0435u043bu044cu043du043eu0433u043e unit 7 with a cylindrical target 5 in any u043du0430u043fu0435u0440 ed a set position.the control system of the belt 17 16 contains u043au0438u043du0435u043cu0430u0442u0438u0447u0435u0441u043au0438 related reference star 19 guided u0448u0435u0441u0442u0435u0440u043du0435u0439 18 speed transmission u0440u0430u0441u043fu044bu043bu0438u0442u0435u043bu044cu043du043eu0433u043e blo ka 7, and one with 20 stars 19 by the width of the control
机译:本发明涉及一种等离子技术,设计用于对金属,半导体薄膜以及固体表面上的密度和x化合物进行真空离子等离子镀膜。技术成果是提高生产效率 u043c u0430 u0433 u043d u0435 u0442 u0440 u043e u043d u043d u043e u0439圆柱型工艺喷雾系统,以确保完全除去制冷剂的冷却并简化设计 u043c u0430 u0433 u043d u0435 u0442 u0440 u043e u043d u0430。该系统包含真空室的节点1,供气和排放通道(分别为2至3个冷却液和压缩空气),电机4, u0440 u0435 u043c u0435 u043d诺亚(Noah)驱动旋转15 u0440 u0430 u0441 u043f u044b u043b u0438 u0442 u0435 u043b u044c u043d u043e u0433 u043e圆柱目标5、6具有驱动控制系统带17,带磁力系统的拉格朗日支撑管8,带有橡胶装置12的目标的前部10和凸缘11。图11中包括一个径向孔13,与固定支撑管8连接在一起。靶5的前凸缘10还包括径向开口14,前凸缘10和后凸缘11的径向开口相连,并且靶被交叉切割。形成其中心轴的法兰的方向,并与通道2、3相连,以供应和排出冷却液。带驱动速度控制系统6的控制系统包括16的旋转和固定速度 u0440 u0430 u0441 u043f u044b u043b u0438 u0442 u0435 u043b u044c u043d u043e u0433 u043e单元7在任何设定位置都具有圆柱形靶5,皮带的控制系统17 16包含 u043a u0438 u043d u0435 u043c u0430 u0442 u0438 u0447 u0435 u0441 u043a u0438相关参考星19向导 u0448 u0435 u0441 u0442 u0442 u0435 u0440 u043d u0435 u0439 18速变速器 u0440 u0430 u0441 u043f u044b u043b u0438 u0442 u0435 u043b u044c u043d u043e u0433 u043e blo ka 7,还有一个20星19由宽度控制

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