首页> 外国专利> GLASS FOR MAGNETIC RECORDING MEDIA SUBSTRATES, MAGNETIC RECORDING MEDIA SUBSTRATES, MAGNETIC RECORDING MEDIA AND METHOD FOR PREPARATION THEREOF

GLASS FOR MAGNETIC RECORDING MEDIA SUBSTRATES, MAGNETIC RECORDING MEDIA SUBSTRATES, MAGNETIC RECORDING MEDIA AND METHOD FOR PREPARATION THEREOF

机译:用于磁记录介质基体的玻璃,磁记录介质基体,磁记录介质及其制备方法

摘要

Abstract Glass for Magnetic Recording Media Substrates, Magnetic Recording Media Substrates, Magnetic Recording Media and Method for Preparation thereof The present invention relates to a glass for a magnetic recording medium substrate permitting the realization of a magnetic recording medium substrate affording good chemical durability and having an extremely flat surface, magnetic recording medium substrate a comprised of this glass, magnetic a recording medium equipped with this substrate, and methods of manufacturing the same. The glasses comprise an oxide of a first glass, comprising, as mass percentages: Si 20 to 40 percent, A! 0.1 to 10 percent, Li 0.1 to 5 percent, Na 0.1 to 10 percent, K 0 to 5 percent (where the total content of Li, Na, and is K 15 percent or less) Sn 0.005 to 0.6 percent, and Ce 0 to 1.2 percent; the Sb content is 0 to 0.1 percent; and not comprising As or F; and by having a A (Lambda) 80 of 320 or greater; an oxide of a second glass, comprising, as molar percentages: Si0 2 60 to 75 percent, Al 0 2 3 1 to 15 percent, Li 0 2 0.1 to 20 percent, Na 0 2 0.1 to 15 percent, and K 0 2 0 to 5 percent (where the total content of Li 0, 2 Na 0, 2 and K 0 2 is 25 percent or lower); based on the total amount of the glass components, 0.01 to 0.7 mass percent of Sn oxide and 0 to 1.4 mass percent of Ce oxide are added; the content of Sb oxide is 0 to 0.1 mass percent; and not comprising As or F; and an oxide of a third glass, comprising, as molar percentages: Si0 2 60 to 75 percent, AI2O3 1 to 15 percent, 229 Li 0 2 0.1 to 20 percent, Na 0 2 0.1 to 15 percent, K 0 2 0 to 5 percent (where the total content of Li 0, 2 Na 0, 2 and K 0 2 is 25 percent or less); by comprising a 0.1 to 3.5 mass percent of total content of Sn oxide and Ce oxide, based on the total amount of the glass components; the ratio of the Sn oxide content to the total content of Sn oxide and Ce oxide (Sn oxide content/(Sn oxide content + Ce oxide content)) is 0.01 to 0.99; the Sb oxide content is 0 to 0.1 percent; and comprising no As or and optionally F having a A (Lambda) 80 of 320 or greater. Figure 1. 230
机译:磁记录介质基板用玻璃,磁记录介质基板,磁记录介质及其制备方法技术领域本发明涉及用于磁记录介质基板的玻璃,其允许实现具有良好化学耐久性并具有良好化学耐久性的磁记录介质基板。极其平坦的表面,由该玻璃构成的磁记录介质基板a,对配备有该基板的记录介质进行磁化,以及制造该基板的方法。该玻璃包括第一玻璃的氧化物,该第一玻璃的氧化物以质量百分比包括:Si 20至40%,Al! 0.1%至10%,Li 0.1%至5%,Na 0.1%至10%,K 0%至5%(其中Li,Na和K的总含量为15%以下)Sn 0.005%至0.6%,Ce 0至1.2%; Sb含量为0〜0.1%。不包含As或F;且A(Lambda)80为320或更大;第二玻璃的氧化物,以摩尔百分比计包括:SiO 2 60至75%,Al 0 2 3 1至15%,Li 0 2 0.1至20%,Na 0 2 0.1至15%和K 0 2 0到5%(其中Li 0、2 Na 0、2和K 0 2的总含量为25%或更低);基于玻璃成分的总量,添加0.01〜0.7质量%的Sn氧化物和0〜1.4质量%的Ce氧化物。 Sb氧化物的含量为0〜0.1质量%。不包含As或F;以及第三玻璃的氧化物,其以摩尔百分比计包括:SiO 2 60至75%,Al 2 O 3 1至15%,229 Li 0 2 0.1至20%,Na 0 2 0.1至15%,K 0 2 0至5 %(Li 0,2 Na 0,2和K 0 2的总含量为25%以下);以玻璃成分的总量为基准,使Sn氧化物和Ce氧化物的总含量为0.1〜3.5质量%。 Sn氧化物含量与Sn氧化物和Ce氧化物的总含量之比(Sn氧化物含量/(Sn氧化物含量+ Ce氧化物含量)为0.01〜0.99。 Sb氧化物的含量为0〜0.1%。并且不包含具有320或更大的A(λ)80的As或任选的F。图1. 230

著录项

  • 公开/公告号SG10201408031RA

    专利类型

  • 公开/公告日2015-01-29

    原文格式PDF

  • 申请/专利权人 HOYA CORPORATION;

    申请/专利号SG10201408031R

  • 发明设计人 HACHITANI YOICHI;OSAKABE KINOBU;

    申请日2009-03-18

  • 分类号

  • 国家 SG

  • 入库时间 2022-08-21 15:12:41

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