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Test device for testing a connective layer between wafer-shaped samples and test method for testing the connective layer
Test device for testing a connective layer between wafer-shaped samples and test method for testing the connective layer
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机译:用于测试晶片状样品之间的连接层的测试装置以及用于测试连接层的测试方法
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摘要
The method involves generating a layer thickness profile along a measuring track in defect region of compound layer (4), with blanked out reference arm (12) of the test device (1) and receiving a distance measurement profile on same measurement track with reference arm. A profile is generated using alternating scan measurement of layer thickness and distance between reference arm positions on same scan measuring track. The profile is compared with layer thickness profile and distance profile for classification of measured peak values as thickness readings or distance measurements.
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