GLASS SUBSTRATE FINISH-POLISHING METHOD AND ALKALI-FREE GLASS SUBSTRATE THAT HAS BEEN FINISH-POLISHED BY SAID METHOD

摘要

The present invention pertains to a glass substrate finish-polishing method in which a polishing slurry including cerium oxide as polishing abrasive grains is used to polish the main surface of a glass substrate. The composition of the glass substrate is an alkali-free glass, and the glass substrate finish-polishing method includes a step for polishing under conditions in which 0.04/X is 0.12 or more if the glass substrate polishing amount is X (μm) when the height of undulations in the main surface of the glass substrate that have been converted to undulations having a 20 mm pitch changes from 0.14 μm to 0.10 μm.