首页> 外国专利> PRETREATMENT SOLUTION FOR ELECTROLESS NICKEL PLATING OR ELECTROLESS NICKEL ALLOY PLATING, AND PLATING METHOD

PRETREATMENT SOLUTION FOR ELECTROLESS NICKEL PLATING OR ELECTROLESS NICKEL ALLOY PLATING, AND PLATING METHOD

机译:化学镀镍或化学镀镍的预处理溶液及镀敷方法

摘要

A pretreatment solution which is brought into contact with a non-conductive substrate for pretreatment, said substrate being to be subjected to electroless nickel plating or electroless nickel alloy plating. The pretreatment solution is obtained by dispersing nickel particles in a solvent. The nickel particles have an average particle diameter of 1-200 nm, and are contained in an amount of 1-80% by weight relative to the pretreatment solution. By performing electroless nickel plating or electroless nickel alloy plating after immersing the non-conductive substrate into the pretreatment solution, a uniform plating film is formed over the entire surface of the non-conductive substrate.
机译:使预处理溶液与不导电的基材接触以进行预处理,所述基材要进行化学镀镍或化学镀镍合金。通过将镍颗粒分散在溶剂中获得预处理溶液。镍颗粒的平均粒径为1-200nm,并且相对于预处理溶液的含量为1-80重量%。在将非导电性基板浸入到预处理溶液中之后,通过进行化学镀镍或化学镀镍合金,在非导电性基板的整个表面上形成均匀的镀膜。

著录项

  • 公开/公告号KR20140131927A

    专利类型

  • 公开/公告日2014-11-14

    原文格式PDF

  • 申请/专利权人 ISHIHARA CHEMICAL CO. LTD.;

    申请/专利号KR20147023409

  • 发明设计人 KUDO TOMIO;UCHIDA EI;TANAKA KAORU;

    申请日2013-01-28

  • 分类号C23C18/18;C23C18/36;

  • 国家 KR

  • 入库时间 2022-08-21 15:01:36

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