首页> 外国专利> METHOD FOR OPTIMIZING ANGULAR VELOCITY OF CRUCIBLE TO GROW HIGH QUALITY SILICON SINGLE CRYSTAL AND EXTEND LIFE OF CRUCIBLE

METHOD FOR OPTIMIZING ANGULAR VELOCITY OF CRUCIBLE TO GROW HIGH QUALITY SILICON SINGLE CRYSTAL AND EXTEND LIFE OF CRUCIBLE

机译:优化坩埚角速度以生长高质量硅单晶和坩埚寿命的方法

摘要

With regard to a crystal growth method for growing single crystal silicon into an ingot by soaking a single crystal seed in a crucible containing a polysilicon melt and rotating the crucible at 8-10 rpm, the present invention can reduce the concentration of oxygen dissolved between the inner wall of the crucible and the melt, thereby controlling the concentration of oxygen which flows into the single crystal silicon. According to the present invention, the concentration of oxygen which flows into the ingot is reduced, thereby allowing the growth of a high quality single crystal and particularly preventing bubble expansion from the inner wall of the crucible.;COPYRIGHT KIPO 2015
机译:关于通过将单晶种浸入包含多晶硅熔体的坩埚中并以8-10 rpm旋转坩埚来将单晶硅生长为晶锭的晶体生长方法,本发明可以降低溶解在硅中的氧的浓度。坩埚的内壁和熔体,从而控制流入单晶硅的氧的浓度。根据本发明,降低了流入铸锭的氧气的浓度,从而允许高质量单晶的生长,并且特别地防止气泡从坩埚的内壁膨胀。; COPYRIGHT KIPO 2015

著录项

  • 公开/公告号KR20150000669A

    专利类型

  • 公开/公告日2015-01-05

    原文格式PDF

  • 申请/专利权人 WOONGJIN ENERGY CO. LTD.;

    申请/专利号KR20130073069

  • 发明设计人 KIM KWANG HUNKR;LEE HEON CHEOLKR;

    申请日2013-06-25

  • 分类号C30B15/30;C30B13/32;

  • 国家 KR

  • 入库时间 2022-08-21 15:00:58

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