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FOUR-ELECTRODE STRUCTURE WITH FINE PATTERN BASED ON SEMICONDUCTOR FABRICATION TECHNOLOGY
FOUR-ELECTRODE STRUCTURE WITH FINE PATTERN BASED ON SEMICONDUCTOR FABRICATION TECHNOLOGY
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机译：基于半导体制造技术的精细图形四电极结构
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摘要
The present invention relates to a four-electrode structure with fine pattern for electric filed loading application which: is used for a vacuum electronic device; is easy to fabricate at lower cost; satisfies high process precision; and ensures a stable feature control in an electromagnetic wave process through a stabilized silicon photocrystalline lattice.;COPYRIGHT KIPO 2015
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