首页> 外国专利> Hydrogen permeation barrier layer and hydrogen storage device comprising the same

Hydrogen permeation barrier layer and hydrogen storage device comprising the same

机译:氢渗透阻挡层和包括该氢渗透阻挡层的储氢装置

摘要

The present invention relates to a hydrogen permeation barrier layer having a hydrogen repulsion layer of n/p/n or p/n/p structures wherein an n-type semiconductor and a p-type semiconductor are multi-joined, and to a hydrogen storage device comprising the same. The present invention can prevent hydrogen leakage and cavitation damage by more effectively repulsing hydrogen permeating an inner wall of a hydrogen storage container than an existing hydrogen repulsion layer having an n/p or p/n single junction structure where only one depleted layer exists as the applied voltage increases; and two depleted layers are expanded on the inside of the hydrogen repulsion layer regardless of the polarity of the applied voltage from the outside. Also, the hydrogen repulsion layer having n/p/n or p/n/p multi junction structures of the present invention has strong resistance against static electricity and electric overload. Accordingly, the life span and stability of the hydrogen storage container can be improved.
机译:本发明涉及具有n / p / n或p / n / p结构的氢排斥层的氢渗透阻挡层,其中n型半导体和p型半导体被多接合。包括它的设备。与现有的仅具有一个耗尽层作为n的耗尽层的n / p或p / n单结结构的现有氢排斥层相比,本发明可以通过更有效地排斥渗透到储氢容器内壁中的氢来防止氢泄漏和气蚀损害。施加电压增加;并且,无论从外部施加的电压的极性如何,在氢排斥层的内部都膨胀有两个耗尽层。另外,本发明的具有n / p / n或p / n / p多结结构的氢排斥层具有强的抗静电性和电过载性。因此,可以提高储氢容器的寿命和稳定性。

著录项

  • 公开/公告号KR101482854B1

    专利类型

  • 公开/公告日2015-01-15

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20130054739

  • 发明设计人 최철종;김종희;

    申请日2013-05-15

  • 分类号B01D69/12;B01D71/02;B01D53/22;C01B3/50;

  • 国家 KR

  • 入库时间 2022-08-21 14:58:49

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