APPARATUSES FOR ADJUSTING ELECTRODE GAP IN CAPACITIVELY-COUPLED RF PLASMA REACTOR

摘要

The plasma processing chamber includes a cantilever assembly is configured to reduce the atmospheric load . This chamber includes a wall surrounding the opening is formed in an inner region . The cantilever assembly includes a substrate support for supporting a substrate within the chamber. Cantilever assembly extends through the opening to a portion located outside the chamber . The chamber includes an operating mechanism operable to move the cantilever assembly to the wall . ; plasma processing chamber , air load , the cantilever assembly and the substrate support , the working mechanism