CHARGED PARTICLE SYSTEM CONTAINING A MANIPULATOR FOR MANIPULATING ONE OR MORE BEAMS OF CHARGED PARTICLES

摘要

1. A charged particle system, such as a multi-beam lithography system, comprising a manipulator device for manipulating one or more beams of charged particles, the manipulator device comprising: a flat substrate containing at least one through hole in a plane of a flat substrate, this, each through hole is configured to pass at least one beam of charged particles through it, and each through hole is provided with electrodes placed in the first set of many first x electrodes along the first part of the perimeter of said through hole and in a second set of a plurality of second electrodes along the second part of said perimeter; an electronic control circuit configured to provide voltage differences to the pairs of electrodes, each pair consisting of a first electrode of the first set and a second electrode of the second set depending on the position of the first and second electrodes around the perimeter of the through hole, in order to provide an electric field, which is substantially uniform throughout the through hole. 2. The charged particle system according to claim 1, in which the electronic control circuit is configured to provide said voltage differences to said pairs depending on the distance between the first electrode and the second electrode of the corresponding pair, preferably said voltage differences are directly proportional to said distance. The charged particle system according to claim 1, wherein the electrodes are uniformly distributed along said perimeter. Charge System