A method of structuring line-type features using a multi-structuring process that enables the use of narrower contact inclusion spacing rules

摘要

A method of identifying a structure for an overall target intersection mask used in structuring line-like features comprising a non-rectangular target aperture feature having an inner concave corner, dividing the entire target intercept mask structure into first and second target sub-structures, wherein the first target sub-structure is a first rectangular aperture feature according to a first region, but not the entire non-rectangular target opening feature, and the second target substructure comprises a second rectangular opening feature corresponding to a second area but not the entire non-rectangular target opening feature, the first and second openings adjacent to the inner concave Corner, and generating first and second sets of mask data according to the first and second target sub-structures, wherein the first and / or second sets of mask data are based on an identified distance rule generated by the contact to the end of the cutting line.