首页> 外国专利> DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS

DUAL-LENS-GUN ELECTRON BEAM APPARATUS AND METHODS FOR HIGH-RESOLUTION IMAGING WITH BOTH HIGH AND LOW BEAM CURRENTS

机译:双透镜枪电子束设备和高,低束流高分辨成像的方法

摘要

One embodiment relates to an electron beam apparatus which includes a dual-lens electron gun for emitting an electron beam. The electron beam is a high beam-current electron beam in a first operating mode and a low beam-current electron beam in a second operating mode. The apparatus further includes a column aperture which is out of the path of the high beam-current electron beam in the first operating mode and is centered about an optical axis of the electron beam apparatus in the second operating mode. Another embodiment relates to an electron gun which includes a first gun lens, a beam limiting aperture, and a second gun lens. The first gun lens focuses the electrons before they pass through the beam-limiting aperture while the second gun lens focuses the electrons after they pass through the beam-limiting aperture. Other embodiments, aspects and features are also disclosed.
机译:一个实施例涉及一种电子束装置,其包括用于发射电子束的双透镜电子枪。该电子束在第一操作模式下是远流电子束,而在第二操作模式下是近流电子束。该设备还包括柱孔,该柱孔在第一操作模式下不在远流电子束的路径内,并且在第二操作模式下以电子束设备的光轴为中心。另一实施例涉及一种电子枪,其包括第一枪透镜,束限制孔和第二枪透镜。第一枪透镜在电子通过束限制孔之前聚焦电子,而第二枪透镜在电子通过束限制孔之后聚焦电子。还公开了其他实施例,方面和特征。

著录项

  • 公开/公告号EP2896062A4

    专利类型

  • 公开/公告日2016-06-08

    原文格式PDF

  • 申请/专利权人 KLA-TENCOR CORPORATION;

    申请/专利号EP20130837241

  • 发明设计人 JIANG XINRONG;HAN LIQUN;

    申请日2013-09-13

  • 分类号H01J37/26;

  • 国家 EP

  • 入库时间 2022-08-21 14:51:31

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