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Plasma excitation method and system in capacitively coupled reactor with trapezoidal waveform excitation

机译:具有梯形波形激励的电容耦合电抗器中的等离子体激励方法和系统

摘要

The invention concerns a method for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
机译:本发明涉及一种用于激发包含衬底的电容耦合反应性等离子体反应器的至少一个电极的方法。通过施加具有梯形波形的RF电压来激励电极,该梯形波形包括上升,高平稳,下降和低平稳。可以通过调节斜波上升的持续时间,斜波下降的持续时间,梯形波形的幅度和重复率来控制等离子体密度。可以通过调节梯形波形的高平稳段和低平稳段之间的幅度和相对持续时间来控制基板上的离子能量分布函数。

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