首页> 外国专利> Copper clad laminate for processing the copper foil and the copper-clad laminate and printed wiring board using the copper-clad laminate obtained by bonding the treated copper foil to the insulating resin substrate

Copper clad laminate for processing the copper foil and the copper-clad laminate and printed wiring board using the copper-clad laminate obtained by bonding the treated copper foil to the insulating resin substrate

机译:用于处理铜箔的覆铜层压板和覆铜层压板以及使用通过将处理后的铜箔粘合到绝缘树脂基板而获得的覆铜层压板的印刷线路板

摘要

PROBLEM TO BE SOLVED: To provide a treated copper foil which exhibits firm peel strength to an insulating resin substrate regardless of low roughness degree, and in which after the treated copper foil is subjected to hygroscopic treatment and then immersed in an activating treatment liquid, the deterioration rate of peel strength is made to be low, and the amount of the activating treatment liquid to soak thereinto is small after the treated copper foil is immersed in the activating treatment liquid, and which has excellent etching properties.;SOLUTION: A roughened layer, a chromate layer and a silane coupling agent layer are arranged successively on the surface of the treated copper foil to be stuck to the insulating resin substrate. The surface of the treated copper foil has ten-point average roughness Rz of 1.0-2.7 m, and the local crests has average space S of 0.0230 mm (except 0).;COPYRIGHT: (C)2012,JPO&INPIT
机译:解决的问题:提供一种处理后的铜箔,该处理后的铜箔对绝缘树脂基板的剥离强度低,粗糙度低,并且在对处理后的铜箔进行吸湿处理后再浸渍在活化处理液中,将剥离后的铜箔浸入活化处理液中后,剥离强度的劣化率降低,并且浸渍在其中的活化处理液的量少,并且具有优异的蚀刻性能。在被处理的铜箔的表面上依次配置铬酸盐层和硅烷偶联剂层,并粘贴在绝缘树脂基板上。处理过的铜箔表面的十点平均粗糙度Rz为1.0-2.7 m,局部波峰的平均间距S为0.0230 mm(0除外)。;版权所有:(C)2012,JPO&INPIT

著录项

  • 公开/公告号JP5885054B2

    专利类型

  • 公开/公告日2016-03-15

    原文格式PDF

  • 申请/专利权人 福田金属箔粉工業株式会社;

    申请/专利号JP20100087794

  • 发明设计人 真鍋 久徳;岡本 健;

    申请日2010-04-06

  • 分类号C25D7/06;C25D5/16;C23C28;H05K1/09;H05K3/38;

  • 国家 JP

  • 入库时间 2022-08-21 14:42:06

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