NOVEL SURFACTANTS WITH LOWER CMC, AND SURFACTANT SYSTEMS AND DETERGENTS CONTAINING SAID SURFACTANTS

摘要

The invention relates to surfactants of the formula (I), in which R¹ stands for —H or —CH₃; R², R³, R⁴, R⁵, R⁶ independently stand for —H, —CH₃, —CH₂CH₃, —CH₂CH₂CH₃, —CH(CH₃)₂, —CH₂CH₂CH₂CH₃, —CH₂CH(CH₃)₂, —CH(CH₃)CH₂CH₃, —C(CH₃)₃, —OH, —OCH₃, —OCH₂CH₃, —OCH₂CH₂CH₃, —OCH(CH₃)₂, a linear or branched alkyl group containing 8 to 20 C atoms, or —SO₃⁻X⁺; X⁺ stands for a monovalent cation or the nth part of an n-valent cation; exactly one radical R², R³, R⁴, R⁵, R⁶ stands for —SO₃⁻X⁺; and exactly one radical R², R³, R⁴, R⁵, R⁶ stands for a linear or branched alkyl radical containing 8 to 20 C atoms.