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Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structures
Methods and apparatus for calculating electromagnetic scattering properties of a structure using a normal-vector field and for reconstruction of approximate structures
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机译:使用法向矢量场计算结构的电磁散射特性并重建近似结构的方法和设备
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摘要
A projection operator framework in the field of lithographic semiconductor processing is described to analyze the concept of localized normal-vector fields within field-material interactions in a spectral basis, in isotropic and anisotropic media, which may be used in for example RCWA (Rigorous Coupled Wave Analysis), the Differential Method, and the Volume-Integral Method. This greatly improves the flexibility of the normal- vector field approach and also leads to significant saving of CPU time to set up these fields. The method has the steps: 1402, generate a localized normal-vector field n in a region of the structure defined by the material boundary, decomposed into sub-regions with a predefined normal-vector field and possibly corresponding closed-form integrals. 1404, construct a continuous vector field F using the normal-vector field to select continuous components ET and Dn. 1406, localized integration of normal- vector field n over the sub- regions to determine coefficients of, C. 1408, determine components Ex, Ey, EZ of the electromagnetic field by using field-material interaction operator C to operate on vector field F. 1410, calculate electromagnetic scattering properties of the structure using the determined components of the electromagnetic field.
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机译:描述了光刻半导体处理领域中的投影算子框架,以分析在各向同性和各向异性介质中以光谱为基础的场-材料相互作用内的局部法向矢量场的概念,例如,可以在RCWA(Rigorous Coupled)中使用波动分析),微分方法和体积积分方法。这大大提高了法向矢量场方法的灵活性,并且还大大节省了设置这些场的CPU时间。该方法具有以下步骤:1402,在由材料边界定义的结构的区域中生成局部法向矢量场n,该区域被分解为具有预定义法向矢量场和可能对应的闭合形式积分的子区域。 1404,使用法向矢量场构造连续矢量场F,以选择连续分量E T Sub>和D n Sub>。 1406,在子区域上对法向矢量场n进行局部积分,以确定C的系数。1408,确定分量E x Sub>,E y I> 通过使用场-材料相互作用算子C对矢量场F进行操作,产生电磁场的Sub>,E Z Sub>。1410,使用确定的电磁场分量计算结构的电磁散射特性。
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