FEMTOSECOND LASER TWO-PHOTON POLYMERIZATION MICRO/NANOSCALE MACHINING SYSTEM AND METHOD

摘要

A femtosecond laser two-photon polymerization micro/nanoscale machining system and method, the system comprising: a femtosecond laser device (11), an external light path modulation unit (12), an image capturing device (13), a focusing lens (14), a positioning stage (16), a computer (17) and a monitoring device (18); the image capturing device (13) captures images of the sectional patterns of a three-dimensional micro/nanoscale device layer by layer, allowing the modulated femtosecond laser to form parallel light beams arranged according to respective layers of sectional patterns. The technical solution can simultaneously machine a plurality of three-dimensional micro/nanoscale devices, and can machine any complicated three-dimensional micro/nanoscale device layer by layer, thus improving machining efficiency and a process flow rate. In addition, during the process of machining a micro/nanoscale device layer by layer, the positioning stage (16) only needs to move in a sectional thickness direction of the micro/nanoscale device, thus improving machining efficiency and the process flow rate, and decreasing precision requirements when positioning in a planar two-dimensional direction, thereby simplifying the machining process and reducing difficulty.