IMPEDANCE MATCHING ARRANGEMENT FOR A GAS-LASER EXCITATION ASSEMBLY AND GAS-LASER EXCITATION ASSEMBLY

摘要

The invention relates to an impedance matching arrangement for a gas-laser excitation assembly (1, 1'), said arrangement comprising a high-frequency connection line (11b, 11b') which can be connected at a first connection point (20.1, 20.1') to a power source (20) and at a second connection point (10.1, 10.1') to a gas-laser electrode (5, 5'). The arrangement is characterised in that the impedance of at least one section (24, 24') of the high-frequency connection line (11b, 11b') changes by means of a change to the configuration, in particular to a parameter of the high-frequency connection line (11b, 11b') in said section.