首页> 外国专利> DETECTION OF GENE MUTATION BY NANOPARTICLE-DNA CORONA COMPLEX AND AU OR SI SUBSTRATE VIA KELVIN PROBE FORCE MICROSCOPY

DETECTION OF GENE MUTATION BY NANOPARTICLE-DNA CORONA COMPLEX AND AU OR SI SUBSTRATE VIA KELVIN PROBE FORCE MICROSCOPY

机译:通过开尔文探针力显微镜检测纳米粒子-DNA冠状复合物和au或SI基质的基因突变。

摘要

The present invention relates to a high-sensitive genetic mutation detection method based on a DNA-nanoparticle composite by an Au or Si substrate using Kelvin probe force microscopy (KPFM), more specifically, to a method which limits the kind of nanoparticles and substrates to optimize the surface potential measurement using the KPFM to detect the mutation of genes, and identifies the mutation of genes by fixing probe DNA to nanoparticles, spreading a compound hybridized with target DNA on an Au or Si substrate, and using the surface potential measured by the KPFM.
机译:本发明涉及一种利用开尔文探针力显微镜(KPFM)基于Au或Si底物的DNA-纳米颗粒复合物的高灵敏度遗传突变检测方法,更具体地,涉及一种将纳米颗粒和底物的种类限制为使用KPFM优化表面电势测量以检测基因突变,并通过将探针DNA固定在纳米颗粒上,将与目标DNA杂交的化合物散布在Au或Si衬底上并使用通过KPFM。

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