首页> 外国专利> METHOD FOR SYNTHESIZING MESOPOROUS HOLLOW NANOSILICA MATERIALS AT LOW TEMPERATURES AND NANOSILICA MATERIALS MANUFACTURED THEREBY

METHOD FOR SYNTHESIZING MESOPOROUS HOLLOW NANOSILICA MATERIALS AT LOW TEMPERATURES AND NANOSILICA MATERIALS MANUFACTURED THEREBY

机译:低温介孔中空纳米二氧化硅材料及其制备的纳米二氧化硅材料的合成方法

摘要

The present invention relates to a method for synthesizing mesoporous hollow nanosilica materials at low temperatures comprising the following steps: (a) dispersing polystyrene (PS) particles in an ethanol solution; (b) stirring by adding tetraethylorthosilicate (TEOS) to the dispersed solution; (c) stirring by adding a surfactant to the TEOS added solution; (d) forming a mixed solution by adding ammonia water; (e) stirring the mixed solution (f) drying after washing and filtering the stirred mixed solution; and (g) plasticizing the dried sample. The shell thickness of the nanosilica material is adjusted by the concentration or plasticizing temperature of the TEOS. The present invention provides: the synthesis method which can easily synthesize various sized core materials by synthesizing the core materials at low temperatures and adjusting the shell thickness of the core materials through adjustment of the concentration and plasticizing temperature of the TEOS; and high quality mesoporous hollow nanosilica materials manufactured by the method.;COPYRIGHT KIPO 2016
机译:本发明涉及一种在低温下合成介孔中空纳米二氧化硅材料的方法,该方法包括以下步骤:(a)将聚苯乙烯(PS)颗粒分散在乙醇溶液中; (b)通过向分散溶液中加入原硅酸四乙酯(TEOS)进行搅拌; (c)通过在加入TEOS的溶液中加入表面活性剂进行搅拌; (d)通过添加氨水形成混合溶液; (e)搅拌混合溶液;(f)在洗涤和过滤搅拌后的混合溶液后干燥; (g)使干燥的样品增塑。纳米二氧化硅材料的壳厚度通过TEOS的浓度或增塑温度来调节。本发明提供了一种合成方法,通过在低温下合成核材料并通过调节TEOS的浓度和塑化温度来调节核材料的壳厚度,可以容易地合成各种尺寸的核材料。以及通过该方法制造的高质量中孔纳米二氧化硅空心材料。; COPYRIGHT KIPO 2016

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