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METHOD FOR SYNTHESIZING MESOPOROUS HOLLOW NANOSILICA MATERIALS AT LOW TEMPERATURES AND NANOSILICA MATERIALS MANUFACTURED THEREBY
METHOD FOR SYNTHESIZING MESOPOROUS HOLLOW NANOSILICA MATERIALS AT LOW TEMPERATURES AND NANOSILICA MATERIALS MANUFACTURED THEREBY
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机译:低温介孔中空纳米二氧化硅材料及其制备的纳米二氧化硅材料的合成方法
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摘要
The present invention relates to a method for synthesizing mesoporous hollow nanosilica materials at low temperatures comprising the following steps: (a) dispersing polystyrene (PS) particles in an ethanol solution; (b) stirring by adding tetraethylorthosilicate (TEOS) to the dispersed solution; (c) stirring by adding a surfactant to the TEOS added solution; (d) forming a mixed solution by adding ammonia water; (e) stirring the mixed solution (f) drying after washing and filtering the stirred mixed solution; and (g) plasticizing the dried sample. The shell thickness of the nanosilica material is adjusted by the concentration or plasticizing temperature of the TEOS. The present invention provides: the synthesis method which can easily synthesize various sized core materials by synthesizing the core materials at low temperatures and adjusting the shell thickness of the core materials through adjustment of the concentration and plasticizing temperature of the TEOS; and high quality mesoporous hollow nanosilica materials manufactured by the method.;COPYRIGHT KIPO 2016
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