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SHEET FOR SEMICONDUCTOR-RELATED-MEMBER PROCESSING AND PROCESS FOR PRODUCING CHIP USING SAID SHEET

机译:与半导体有关的工艺表以及使用上述工艺表生产芯片的过程

摘要

It is possible to improve the releasability of the sheet for processing a semiconductor-related member and to prevent the reliability of the member including the chip made of the semiconductor-related member from being deteriorated by using the sheet for processing a semiconductor- A member-processing sheet (1) comprising a substrate (2) and a pressure-sensitive adhesive layer (3) formed on one surface of the substrate (2), wherein the pressure- At least one kind of energy ray polymerizable compound is a polymerizable branched polymer which is a polymer having a branched structure and is a polymerizable branched polymer containing an energy ray polymerizable compound having a functional group, Is applied to the mirror surface of the silicon wafer and the energy ray is irradiated to the semiconductor-related-member-processing sheet (1) to form a pressure-sensitive adhesive layer (1) obtained by peeling the semiconductor-related-member-processing sheet (1) from the silicon wafer after the adhesion of the semiconductor-related-member processing sheet (3) is lowered, , A temperature of 25 DEG C and a relative humidity of 50%, a contact angle measured by using water droplets is 40 DEG or less.
机译:通过使用用于处理半导体的片材,可以改善用于处理半导体相关的片材的可剥离性,并且防止包括由半导体相关的构件制成的芯片的构件的可靠性劣化。加工片(1),其包括基材(2)和在所述基材(2)的一个表面上形成的压敏粘合剂层(3),其中所述压力-至少一种能量射线可聚合化合物是可聚合支化聚合物将其为具有分支结构的聚合物并且是包含具有官能团的能量射线可聚合化合物的可聚合的分支聚合物,将其施加到硅晶片的镜面上,并且将能量射线照射到半导体相关构件处理中片(1)形成压敏粘合剂层(1),该压敏粘合剂层是通过将半导体相关元件处理片(1)从硅晶片上剥离后剥离而获得的。如果降低半导体相关部件处理片(3)的密合性,则温度为25℃,相对湿度为50%,使用水滴测定的接触角为40℃以下。

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