METHOD AND APPARATUS FOR MURA DETECTION AND METROLOGY

摘要

The present invention provides devices, and methods, such as optical inspection of suppressing artifacts from Village check the hardware itself and noise and to maximize the sensitivity of the mura effect. And horizontal across the mura effect generated by the high area of the internal precision, is done by scanning a sensor, such as a high-resolution camera. One important example is for the mura related to placement error, in which the stage is produced with a high precision than 10nm within the range 100mm. The sampling plan can reduce the data volume on the basis of the mechanism isolates errors and physical defects to those of the different geometry of the signature. A high resolution camera to the scan line at an angle to the main coarse mura defects of the predicted direction, creating elongated sensor field having a high internal precision and quantified edges arranged in a small window in the extended field. Mura is the type, location, and severity classification and submitted as.