首页> 外国专利> LOW TEMPERATURE PLASMA WATER TREATMENT APPARATUS AND WATER TREATMENT METHOD

LOW TEMPERATURE PLASMA WATER TREATMENT APPARATUS AND WATER TREATMENT METHOD

机译:低温等离子体水处理装置及水处理方法

摘要

The present invention relates to a water treatment apparatus and method for treating advanced water and, more specifically, to a water treatment apparatus and method capable of performing pasteurization and sterilization of advanced water by using low temperature plasma. According to an embodiment of the present invention, the low temperature plasma water treatment apparatus comprises: an inserting part for inserting advanced water; a filter part for filtering a floating material and a solid added to advanced water; a gas injecting part and a liquid injecting part for injecting a gas and a liquid activating a plasma reaction; a first plasma generating part including an electrode device for generating low temperature plasma, and a microbubble generating device for converting injected gas to microbubbles; a gas injecting part and a liquid injecting part installed in parallel with the first plasma generating part, and injecting a gas and a liquid activating a plasma reaction; a second plasma generating part including an electrode device for generating low temperature plasma, and a microbubble generating device for converting injected gas to microbubbles; a valve for controlling inserting of advanced water to the first plasma generating part or the second plasma generating part; and a reaction detecting part for confirming and detecting a color of treated advanced water.;COPYRIGHT KIPO 2016
机译:水处理设备和方法技术领域本发明涉及一种用于处理高级水的水处理设备和方法,更具体地,涉及一种能够通过使用低温等离子体对高级水进行巴氏灭菌和消毒的水处理设备和方法。根据本发明的一个实施例,该低温等离子体水处理设备包括:用于插入高级水的插入部;以及用于插入高级水的插入部。过滤器部件,用于过滤添加到高级水中的漂浮物和固体。气体注入部分和液体注入部分,用于注入气体和液体以激活等离子体反应;第一等离子体产生部分,其包括用于产生低温等离子体的电极装置,以及用于将注入的气体转化为微气泡的微气泡产生装置;与第一等离子体产生部分平行安装的气体注入部分和液体注入部分,并注入气体和液体以激活等离子体反应。第二等离子体产生部分包括:电极装置,用于产生低温等离子体;和微气泡产生装置,用于将注入的气体转化为微气泡;阀,用于控制向第一等离子体产生部或第二等离子体产生部的进水的注入。 COPYRIGHT KIPO 2016;反应检测部分,用于确认和检测处理后的高级水的颜色。

著录项

  • 公开/公告号KR101596869B1

    专利类型

  • 公开/公告日2016-02-23

    原文格式PDF

  • 申请/专利权人 IONCLEAN CO. LTD.;

    申请/专利号KR20150140334

  • 发明设计人 KIM MUN JUKR;

    申请日2015-10-06

  • 分类号C02F1/467;B01D35/02;B01F3/04;C02F1/461;C02F1/74;H05H1/24;

  • 国家 KR

  • 入库时间 2022-08-21 14:12:56

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