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SiO2 METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS BY DEPOSITION OF SiO2 SOOT FROM THE VAPOR PHASE ON A SUPPORT
SiO2 METHOD FOR PRODUCING SYNTHETIC QUARTZ GLASS BY DEPOSITION OF SiO2 SOOT FROM THE VAPOR PHASE ON A SUPPORT
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机译:SiO2法制备气相石英粉体的方法是在气相上沉积SiO2粉尘
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摘要
known method for producing a synthetic quartz glass is, Liquid SiO 2 comprising: providing a feedstock material, the SiO 2 vaporization of the feedstock material into the feed material vapors containing octamethylcyclotetrasiloxane D4 as a main component a step, the feedstock material vapor SiO 2 converting into particles, porous SiO 2 , forming a soot body the SiO 2 particles while the forming step, and the synthetic quartz glass to deposit on the deposition surface comprises a step of liberating the SiO 2 soot body. Starting from this, to generate a large cylindrical soot body having a 300mm over the outer diameter of the improved material homogeneity, in accordance with the present invention, the liquid feed material is its linear analogs having a hexamethyl-cyclo trisiloxane D3 and the weight fraction mD3 , additional components including deca methyl cyclohexasiloxane D6 and weight fraction mD6 their linear analogs, and tetra deca-methylcyclohexyl cyclohepta siloxane D7 and / or hexadecafluorovanadyl methyl cyclooctadiene siloxane D8 and weight fraction mD7 + their linear analogs having having containing, where the weight ratio mD3 / mD6 range is from 0.05 to 90, weight fraction mD7 + is present to at least 20 wt.ppm.
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