RC METHOD OF GENERATING MODIFIED LAYOUT FOR RC EXTRACTION

摘要

The method of the present invention comprises determining a first set of width deviation values of an i-th set of layout patterns of an initial layout in accordance with a width variation of a first type. Where the initial layout has N sets of layout patterns corresponding to N masks, where the i-th set of layout patterns is subjected to the i-th mask assignment corresponding to the i-th mask among the N masks. The sequence index i is an integer from 1 to N and N is an integer greater than one. A second set of width deviation values of the i-th set of layout patterns of the initial layout is determined in accordance with a second type of width variation. A modified layout is generated based on the first set of i-th set of layout patterns and the second set of width deviation values.