Polymeric precursors for production of graphene nanoribbons, and methods of making

摘要

1. Oligofenilenovy monomer of general formula (I) in kotoroyRi independently from each other signify H, halogen, -OH, -NH, -CN, -NOili linear or branched, saturated or unsaturated CC-hydrocarbon residue which may be substituted with 1 -5 halogen (F, Cl, Br, I), -OR ,, -CN and / or -NO, and wherein one or more groups CHmogut be replaced by -O-, -S-, -NR-, -OC (O) - or -C (O) -, or an optionally substituted aryl, alkylaryl, or alkoxyaryl residue; each independently of one another represents H, CC-alkyl, CC-alkenyl, CC-alkynyl, CC-haloalkyl, CC-haloalkenyl, CC -galogenalkinil or CC-acyl; each independently of one another represents H, CC-alkyl, CC-alkenyl, CC-alkynyl, CC-haloalkyl, CC-haloalkenyl, CC-CC-haloalkynyl or acyl; and m is 0, 1, or 2.2. Oligofenilenovy monomer according to Claim. 1, wherein r and independently of one another are H, CC-alkyl, CC-alkoxy, CC-alkylthio, CC-alkenyl, CC-alkynyl, CC-haloalkyl, CC-haloalkenyl or galogenalkinil.3. Oligofenilenovy monomer according to Claim. 1, in which m is equal to 0.4. Oligofenilenovy monomer according to any one of claims. 1-3, wherein Roznachaet linear or branched CC-alkyl and Rs H.5. Application oligofenilenovogo monomer according to any one of claims. 1-4 to give a polymer precursor for forming the graphene nanolent.6. The polymeric precursor is intended to obtain graphene nanoribbons having repeating units of the general formula (II) in kotoroyRi independently from each other signify H, halogen, -OH, -NH, -CN, -NOili linear or branched, saturated or unsaturated hydrocarbon residue CC- which may be substituted by 1-5 halogens (F, Cl, Br, I), -OR ,, -CN and / or -NO, and wherein one or more groups CHmogut be replaced by -O-, -S -, -NR-, -OC (O) - or -C (O) -, or an optionally substituted aryl, alkoxyaryl or alkylaryl moiety;