Damping arrangement for the damping of oscillatory motions of an element in a system

摘要

The invention relates to a damping arrangement for the damping of oscillatory motions of an element in a system, in particular in a microlithographic projection exposure system. According to one aspect has a damping arrangement a first component (110, 210, 310) of electrically conductive material and a second component (120, 220, 320), wherein in the case of attachment of the first component or the second component to the element by an associated with a vibration movement of the element relative movement between the first component and the second component, an electrical current in the first component is induced which a damping of the oscillatory motion, and whereby the first component a capacity of at least 0.1 microfarad (μf) comprises.