An illumination system suitable for applications in the metrology, as well as coordinate measuring machine with such an illumination system

摘要

The present invention relates to an illumination system 30; 30a; 50; 50a, 50b, 50c; 60; 70; 80; 90 for the production of a reflected light - bright field for measuring technology applications comprising a plurality of light sources 31, 32, 33 with mutually different emission spectra and at least a dichroic beam splitter 35 to the superimposition or combination of the light of at least two of the light sources 31, 32, 33 along an optical axis of the illumination system 30; 30a; 50; 50a, 50b, 50c; 60; 70; 80; 90, wherein on the light path of the light sources 31, 32, 33 to the plate to be illuminated field of the illumination system 30; 30a; 50; 50a, 50b, 50c; 60; 70; 80; 90 between the light sources 31, 32, 33 and the at least one beam splitter 35 and / or between the at least one beam splitter 35 and the field to be illuminated at least a first homogenization means 37a, 38a, 39a, 40; 41; 51, 52, 53 to the light mixture is provided, and wherein the at least one homogenizing means 37a, 38a, 39a, 40; 41; 51, 52, 53 to the light mixture is selected or is composed of the optical elements of the group consisting of: rod integrators, hollow space integrators, fiber bundles, lenses - and / or mirrors - arrays, and wherein on or to the at least a dichroic steel divider (35) at least a first collecting lens (37, 38, 39; 37a, 38a, 39a; 55; 55a) by means of additive machining process, cutting machining process and / or by the application of a separately fabricated optical element in the form of an aspherical, a fresnel - lens and / or a diffractive optical element (doe) is designed. Furthermore, the invention relates to a coordinate measuring machine with such a lighting system 30; 30a; 50; 50a, 50b, 50c; 60; 70; 80; 90.