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PLASMA-GENERATING SOURCE COMPRISING A BELT-TYPE MAGNET, AND THIN-FILM DEPOSITION SYSTEM USING SAME
PLASMA-GENERATING SOURCE COMPRISING A BELT-TYPE MAGNET, AND THIN-FILM DEPOSITION SYSTEM USING SAME
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机译:包含带式磁体的等离子体产生源,以及使用相同源的薄膜沉积系统
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摘要
The present invention is about plasma generation source and a thing that is in its application and it is for getting high quality thin film by generating even high density plasma in high vacuum and like this plasma generation source applying like this plasma generation source to sputtering system, neutral particle beam source, thin film deposition system combining sputtering system and neutral particle beam source, According to the present invention, it generates plasma by using microwave through the microwave irradiating equipment and magnetic field by more than one pair of the belt type magnets and above goal can be accomplished maximizing plasma confinement effect by inducing electron returning trajectory in accordance with above continuous structure on belt type magnet.
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