首页> 外国专利> INTERVERTEBRAL IMPLANT AND SYSTEM OF AN INTERVERTEBRAL IMPLANT AND AN INSTRUMENT FOR INSERTING THE INTERVERTEBRAL IMPLANT

INTERVERTEBRAL IMPLANT AND SYSTEM OF AN INTERVERTEBRAL IMPLANT AND AN INSTRUMENT FOR INSERTING THE INTERVERTEBRAL IMPLANT

机译:椎间植入物和椎间植入物的系统以及用于插入椎间植入物的仪器

摘要

An interveiiebral implant is provided comprising:a body with an upper wall (1, 1', 1") configured to engage a first vertebral end plate and a lower wall (2, 2', 2") configured to engage a second vertebral end plate, anda load transmitting part configured to transmit load between the upper wall and the lower wall;wherein the load transmitting part is configured to assume a compressed condition in which a distance between the upper wall and the lower wall defines a first height (H1) of the implant and an expanded condition in which the distance between the upper wall and the lower wall defines a second height (H2) of the implant that is greater than the first height;wherein the load transmitting part is attached to the upper wall on at least two connecting locations (a) and is attached to the lower wall on at least two connecting locations (b) and has substantially an X-shape in front view of the implant; andwherein the implant is made of a material that exhibits shape memory properties that permit the implant to remain in the compressed condition without outside forces acting upon it and to change to the expanded condition in response to directing the temperature to a recovery level.
机译:提供了一种椎间植入物,其包括:主体,其上壁(1、1',1“)构造为与第一椎骨端板接合,而下壁(2、2',2”)构造为与第二椎骨端板接合,以及载荷传递部,其在上壁与下壁之间传递载荷。其中,载荷传递部分构造成处于压缩状态,其中上壁和下壁之间的距离限定植入物的第一高度(H1),并且膨胀状态下,其中上壁和下壁之间的距离限定植入物。限定植入物的第二高度(H2),该第二高度大于第一高度;其中,所述载荷传递部分在至少两个连接位置(a)上附接至所述上壁,并且在至少两个连接位置(b)上附接至所述下壁,并且在所述植入物的正视图中具有大致X形。和其中所述植入物由显示出形状记忆特性的材料制成,所述形状记忆特性允许所述植入物保持在压缩状态而不受外力作用,并且响应于将温度引导至恢复水平而改变到膨胀状态。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号