首页> 外国专利> POLYMER FINE PARTICLE, MANUFACTURING METHOD THEREFOR, EPOXY RESIN COMPOSITION AND SEMICONDUCTOR ENCAPSULATION MATERIAL

POLYMER FINE PARTICLE, MANUFACTURING METHOD THEREFOR, EPOXY RESIN COMPOSITION AND SEMICONDUCTOR ENCAPSULATION MATERIAL

机译:聚合物细颗粒,其制备方法,环氧树脂组成和半导体封装材料

摘要

PROBLEM TO BE SOLVED: To provide a polymer fine particle useful as a powdery stress-lowering agent excellent in heat resistance, having low elasticity and no aggregate, an epoxy resin composition where the polymer fine particle is dispersed uniformly and a semiconductor encapsulation material using the epoxy resin composition.;SOLUTION: There is provided a polymer fine particle consisting of a thermoplastic styrenic elastomer and having average particle diameter of 0.5 μm to 100 μm and narrow particle diameter distribution. Elasticity modulus is reduced by dispersing the polymer fine particle in an epoxy resin composition as a stress-lowering agent uniformly and then a material useful as an additive for semiconductor encapsulation material can be obtained.;SELECTED DRAWING: None;COPYRIGHT: (C)2017,JPO&INPIT
机译:解决的问题:为了提供用作耐热性优异,具有低弹性且无聚集体的粉末状应力降低剂的聚合物细颗粒,使该聚合物细颗粒均匀分散的环氧树脂组合物和使用该聚合物细颗粒的半导体封装材料。解决方案:提供一种由热塑性苯乙烯弹性体组成的聚合物细颗粒,其平均粒径为0.5μm至100μm,且粒径分布窄。通过将聚合物微粒均匀分散在环氧树脂组合物中作为降低应力的剂来降低弹性模量,然后可以获得用作半导体封装材料添加剂的材料。;部分制图:无;版权:(C)2017 ,JPO&INPIT

著录项

  • 公开/公告号JP2017019988A

    专利类型

  • 公开/公告日2017-01-26

    原文格式PDF

  • 申请/专利权人 TORAY IND INC;

    申请/专利号JP20150253619

  • 申请日2015-12-25

  • 分类号C08J3/16;C08F279/02;C08L63/00;C08L53/02;H01L23/29;H01L23/31;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:14

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