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BASE ISOLATION TABLE AND ATTENUATION FORCE APPLYING MEMBER USED FOR BASE ISOLATION TABLE

机译:基本隔离表和用于基本隔离表的成员的衰减力

摘要

PROBLEM TO BE SOLVED: To provide a base isolation table capable of conveniently adding an attenuation element against an inputted vibration and appropriately controlling an action of an upper table against an excessive inputting of vibration and provide an attenuation force applying member used for it.;SOLUTION: There are provided a lower table 2 fixed to a fixing part; an upper table 3 on which an object to be base isolated is mounted; a guide member freely guiding the upper table 3 in X-direction in respect to the lower table 2 and in a Y-direction crossing at a right angle with X-direction and holding the upper table 3 immovably in respect to the lower table 2 in regard to Z-direction crossing at a right angle with both X-direction and Y-direction; and an attenuation force applying member 5 applying a frictional attenuation against motion of the upper table 3 in respect to the lower table 2. The attenuation force applying member 5 is press contacted with both lower table 2 and upper table 3 and relatively moved in respect to both lower table 2 and the upper table 3 as the upper table 3 is moved in respect to the lower table 2.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:提供一种基础隔离台,该基础隔离台能够方便地添加衰减元件抵抗输入的振动,并适当地控制上平台抵抗过度输入的振动的作用,并提供用于其的衰减力施加构件。 :设有固定在固定部上的下部工作台2。在上面的桌子3上安装有被隔离的物体。引导构件,其相对于下桌2在X方向上自由地引导上桌3,并且在与X方向成直角相交的Y方向上自由地引导上桌3,并且相对于下桌2不动地保持上桌3。 Z方向与X方向和Y方向成直角相交;衰减力施加部件5相对于下平台2相对于上平台3的运动而产生摩擦衰减。衰减力施加部件5与下平台2和上平台3两者压接,并且相对于下平台2相对移动。下部工作台2和上部工作台3都作为上部工作台3相对于下部工作台2的移动;;选定的图纸:图1;版权:(C)2018,JPO&INPIT

著录项

  • 公开/公告号JP2017194116A

    专利类型

  • 公开/公告日2017-10-26

    原文格式PDF

  • 申请/专利权人 THK CO LTD;

    申请/专利号JP20160084900

  • 发明设计人 NAKAKUBO KEISUKE;MYOGA HIDEYUKI;

    申请日2016-04-21

  • 分类号F16F15/02;F16F7/08;

  • 国家 JP

  • 入库时间 2022-08-21 14:01:00

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