首页> 外国专利> POLYCARBOXYLIC ACID RESIN AND POLYCARBOXYLIC ACID RESIN COMPOSITION COMPRISING THE SAME, EPOXY RESIN COMPOSITION, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND SEMICONDUCTOR DEVICE

POLYCARBOXYLIC ACID RESIN AND POLYCARBOXYLIC ACID RESIN COMPOSITION COMPRISING THE SAME, EPOXY RESIN COMPOSITION, THERMOSETTING RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND SEMICONDUCTOR DEVICE

机译:包含相同的聚羧酸树脂和聚羧酸树脂组合物,环氧树脂组合物,热固性树脂组合物,相同的固化产品和半导体器件

摘要

PROBLEM TO BE SOLVED: To provide a polycarboxylic acid resin that has a low refractive index and high sulfur resistance, from which a cured product of high transparency can be obtained.SOLUTION: The present invention provides a polycarboxylic acid resin represented by formula (1) (Xis a C1-20 divalent or trivalent organic group or a bond between T and O; if Xis the divalent organic group or the bond between T and O, m is 1, and if Xis the trivalent organic group, m is 2; Xis a C1-20 divalent organic group; T is a Si2-10 chain, branched, or cyclic siloxane skeleton which may have C, H, or N; n is an integer of 2-4).SELECTED DRAWING: Figure 1
机译:解决的问题:提供具有低折射率和高耐硫性的聚羧酸树脂,由此可以获得高透明性的固化产物。解决方案:本发明提供由式(1)表示的聚羧酸树脂。 (X是C1-20二价或三价有机基团或T和O之间的键;如果Xis是二价有机基团或T和O之间的键,则m为1,如果Xis是三价有机基团,则m为2; Xis一个C1-20二价有机基团; T是可具有C,H或N的Si2-10链,支链或环状硅氧烷骨架; n是2-4的整数)。

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