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STRESS MEASUREMENT METHOD AND PHOTOELASTICITY COATING

机译:应力测量方法和光弹性涂层

摘要

PROBLEM TO BE SOLVED: To provide a stress measurement method that is highly accurate and high in sensitivity even under an environment large in a temperature change, and to provide an elasticity coating including a measured object.;SOLUTION: A stress measurement method includes: obtaining a photoelasticity coating having a measured object, an adhesion layer, and a photoelasticity layer included in this order, by adhesion based on the adhesion layer; and detecting a change in birefringence of the photoelasticity layer occurring due to a stress of the measured object in the photoelasticity coating, in which the photoelasticity coating includes a thermal stress buffer layer between the measured object and the photoelasticity layer. Further, the photoelasticity coating to be used in the stress measurement of the measured object, includes the measured object, the adhesion layer, and the photoelasticity layer in this order, and includes the thermal stress buffer layer between the measured object and the photoelasticity layer. The measured object includes a metal, and the thermal stress buffer layer includes epoxy resin.;SELECTED DRAWING: Figure 1;COPYRIGHT: (C)2017,JPO&INPIT
机译:要解决的问题:提供一种即使在温度变化大的环境下也高度准确且灵敏度高的应力测量方法,并提供一种包括被测物体的弹性涂层。解决方案:一种应力测量方法包括:获得通过基于该粘合层的粘合,具有依次包含被测定物,粘合层和光弹性层的光弹性涂层。以及检测由于光弹性涂层中的被测物体的应力而引起的光弹性层的双折射的变化,其中,光弹性涂层在被测物体与光弹性层之间包括热应力缓冲层。此外,在被测物的应力测量中使用的光弹性涂层依次包括被测物,粘附层和光弹性层,并且在被测物与光弹性层之间包括热应力缓冲层。被测物包括金属,热应力缓冲层包括环氧树脂。;选定图:图1;版权所有:(C)2017,JPO&INPIT

著录项

  • 公开/公告号JP2017156235A

    专利类型

  • 公开/公告日2017-09-07

    原文格式PDF

  • 申请/专利权人 FUJIFILM CORP;

    申请/专利号JP20160040131

  • 发明设计人 HODOZAWA YOSHIHITO;HAYASHI TAKUHIRO;

    申请日2016-03-02

  • 分类号G01L1/00;G01L1/24;

  • 国家 JP

  • 入库时间 2022-08-21 13:58:20

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