首页> 外国专利> Method for profiling the surface topography of an absorbent structure of an absorbent article

Method for profiling the surface topography of an absorbent structure of an absorbent article

机译:用于描述吸收制品的吸收结构的表面形貌的方法

摘要

The present disclosure relates to a method and apparatus for generating a profile representing the surface topography of an absorbent structure during manufacture of the absorbent article by sensing distortion of the pattern of reflected light. The inspection system may have sensors arranged adjacent to the advancing absorbent structure on the processing line. The controller can then monitor and influence the various operations on the processing line. The inspection system herein may further comprise a radiation source for illuminating the surface of the absorbent structure with light of a predetermined pattern extending in the transverse direction CD. The sensor detects the distortion of the pattern of light reflected from the illuminated surface of the absorbent structure and measures the change in height of the illuminated surface of the absorbent structure with respect to the sensor by a trigonometric method. Based on the change in height measured by trigonometry, the sensor generates a profile representing the surface topography of the illuminated surface of the absorbent structure.
机译:本发明涉及一种用于在吸收制品的制造过程中通过感测反射光的图案的变形来产生表示吸收结构的表面形貌的轮廓的方法和装置。检查系统可以具有传感器,该传感器布置在处理线上与前进的吸收结构相邻的位置。然后,控制器可以监视并影响处理线上的各种操作。本文中的检查系统还可以包括辐射源,该辐射源用于使用在横向CD上延伸的预定图案的光照射吸收体结构的表面。传感器检测从吸收体结构的被照射表面反射的光的图案的畸变,并通过三角法测量相对于传感器的吸收体结构的被照射表面的高度的变化。基于通过三角测量法测量的高度变化,传感器产生轮廓,该轮廓代表吸收性结构的被照射表面的表面形貌。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号