首页> 外国专利> Vertical cavity surface emitting semiconductor laser, surface emitting semiconductor laser array, method of manufacturing the surface emitting semiconductor laser

Vertical cavity surface emitting semiconductor laser, surface emitting semiconductor laser array, method of manufacturing the surface emitting semiconductor laser

机译:垂直腔表面发射半导体激光器,表面发射半导体激光器阵列,制造表面发射半导体激光器的方法

摘要

PROBLEM TO BE SOLVED: To provide a surface-emitting type semiconductor laser which can operate at high speed.SOLUTION: A surface-emitting type semiconductor layer has a mesa M formed on a semi-insulating semiconductor substrate 100 and containing an n-type contact layer 40; an n-type lower part DBR 102; an active region 104; and a p-type upper part DBR 106. A groove 12 where the mesa is formed, is filled with an insulation material 70. An n-side electrode 50 is electrically connected to the contact layer 40 extending from a side surface of the mesa through a contact hole 74 formed in the insulation material. A p-side electrode 20 is electrically connected to the upper part DBR at an apex of the mesa. There is no contact layer below a metal wiring 52 connected to the n-side electrode and a metal wiring 22 connected to the p-side electrode.
机译:解决的问题:提供一种可高速工作的表面发射型半导体激光器。解决方案:表面发射型半导体层具有形成在半绝缘半导体衬底100上并包含n型接触的台面M。 40层; n型下部DBR 102;有源区104;形成台面的凹槽12填充有绝缘材料70。n侧电极50电连接到从台面的侧面延伸穿过的接触层40,并通过p型上部DBR 106。在绝缘材料中形成的接触孔74。 p侧电极20在台面的顶点处电连接到上部DBR。在连接到n侧电极的金属布线52和连接到p侧电极的金属布线22下方没有接触层。

著录项

  • 公开/公告号JP6206669B2

    专利类型

  • 公开/公告日2017-10-04

    原文格式PDF

  • 申请/专利权人 富士ゼロックス株式会社;

    申请/专利号JP20130239756

  • 发明设计人 武田 一隆;近藤 崇;

    申请日2013-11-20

  • 分类号H01S5/183;H01S5/042;

  • 国家 JP

  • 入库时间 2022-08-21 13:55:27

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