Lithographic resist underlayer film forming composition comprising a polymer containing an acrylamide structure and an acrylate structure

摘要

PROBLEM TO BE SOLVED: To provide a resist underlayer film forming composition for forming a resist underlayer film that can be dry-etched at the time of pattern transfer from an upper layer or processing a substrate and can be removed with an alkaline aqueous solution after the substrate processing. A polymer (A) containing a unit structure represented by the following formula (1) and a unit structure represented by the following formula (2), a blocked isocyanate group, a methylol group, or alkoxymethyl having 1 to 5 carbon atoms. A resist underlayer film forming composition comprising a crosslinkable compound (B) having at least two groups selected from a group and a solvent (C), wherein the polymer (A) is a unit represented by the formula (1) The unit structure represented by the formula (1) and the unit structure represented by the formula (1): the unit structure represented by the formula (2): the unit structure represented by the formula (2) = 25 to 60:75 to 40 The composition is a polymerized polymer. [Chemical 1] [Selected figure] None