首页> 外国专利> ABERRATION-CORRECTION METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM

ABERRATION-CORRECTION METHOD, LASER PROCESSING METHOD USING SAID ABERRATION-CORRECTING METHOD, LASER IRRADIATION METHOD USING SAID ABERRATION-CORRECTING METHOD, ABERRATION-CORRECTING DEVICE AND ABERRATION-CORRECTING PROGRAM

机译:像差校正方法,使用所述像差校正方法的激光加工方法,使用所述像差校正方法的激光照射方法,像差校正设备和像差校正程序

摘要

In an aberration-correcting method according to an embodiment of the present invention, in an aberration-correcting method for a laser irradiation device 1 which focuses a laser beam on the inside of a transparent medium 60, aberration of a laser beam is corrected so that a focal point of the laser beam is positioned within a range of aberration occurring inside the medium. This aberration range is not less than n×d and not more than n×d+Δs from an incidence plane of the medium 60, provided that the refractive index of the medium 60 is defined as n, a depth from an incidence plane of the medium 60 to the focus of the lens 50 is defined as d, and aberration caused by the medium 60 is defined as Δs.
机译:在根据本发明实施例的像差校正方法中,在用于激光束 1 的像差校正方法中,该激光照射装置将激光束聚焦在透明介质 60的内部。 ,校正激光束的像差,以使激光束的焦点位于介质内部发生的像差的范围内。从介质 60 的入射平面起,该像差范围不小于n×d且不大于n×d +Δs,条件是介质 60 的折射率>定义为n,从介质 60 的入射平面到透镜 50 的焦点的深度定义为d,由介质引起的像差> 60 定义为Δs。

著录项

  • 公开/公告号US2017031158A1

    专利类型

  • 公开/公告日2017-02-02

    原文格式PDF

  • 申请/专利权人 HAMAMATSU PHOTONICS K.K.;

    申请/专利号US201615290233

  • 申请日2016-10-11

  • 分类号G02B27;B23K26/03;B23K26/06;B23K26/064;G02B21/06;G02B5/18;G02B21;G02B21/02;G02B21/36;B23K26;B23K26/40;

  • 国家 US

  • 入库时间 2022-08-21 13:46:23

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