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Method and system for in-situ determination of a chemical composition of films during growth process
Method and system for in-situ determination of a chemical composition of films during growth process
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机译:在生长过程中原位确定薄膜化学成分的方法和系统
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摘要
System and method for determining the composition of deposited thin films by acquiring multiple sequential X-ray spectra for a film of interest during the deposition process as the film thickness increases, computing intensities of peaks found in the X-ray spectra corresponding to elements present in the film material, followed by computing, for each pair of elements, ratios of corresponding peak intensities, graphing the intensities and ratios against a parameter correlated to the film thickness, and applying a physically meaningful function to the graphed data for best fitting the data down to a ratio RA/B(0) for each pair of the elements for a virtual film of zero thickness. Elemental concentrations ratio for each pair of elements is subsequently computed as a product of RA/B(0) and a factor which is specific for the pair of elements, constant for the instrument as set up, and independent of elements concentrations, and of film thickness.
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机译:用于确定沉积薄膜的组成的系统和方法,方法是:随着沉积厚度的增加,在沉积过程中获取目标薄膜的多个顺序X射线光谱,并计算与相应元素中存在的元素相对应的X射线光谱中发现的峰强度薄膜材料,然后针对每对元素计算相应峰强度的比率,针对与薄膜厚度相关的参数绘制强度和比率的图形,然后将物理意义上的函数应用于图形数据以最佳地拟合数据对于厚度为零的虚拟膜,每对元素的比率为R A / B Sub>(0)。随后,将每对元素的元素浓度比计算为R A / B Sub>(0)与该元素对所特有的因子,所设置仪器的常数以及与元素浓度和膜厚无关。
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