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Integrated composite perovskite oxide heterostructure

机译:集成复合钙钛矿氧化物异质结构

摘要

An integrated heterostructure material is achieved by combining the attributes of two perovskite oxide film growth methods, RF sputtering and the metallo-organic solution deposition (MOSD) technique, in combination with employing a novel integrated material design consisting of a SrTO3 thin film layer which serves as a template to achieve a property enhanced, BST-based thin film overgrowth. In specific the integrated materials design consists of a thin RF sputtered SrTiO3 film (lower layer) which underlies a substantially thicker MOSD over-growth Mg doped BST-based film (upper layer). The inventive material design and combinational film growth fabrication method thereof enables beneficial critical material/device characteristics which include enhanced dielectric permittivity in concert with low loss; low leakage current density; high voltage breakdown strength; high tunability; controlled and optimized film microstructure; and a smooth surface morphology with minimal surface defects. The invention enables miniature highly (voltage) tunable frequency agile devices and/or charge mediated voltage controlled magnetic devices for RF/microwave communications, RADAR, and electronic warfare applications.
机译:通过结合两种钙钛矿氧化物薄膜生长方法,RF溅射和金属有机溶液沉积(MOSD)技术的属性,结合采用由SrTO 3 < / Sub>薄膜层,其用作模板,以实现基于BST的增强特性的薄膜过度生长。具体而言,集成材料设计由薄的RF溅射SrTiO 3 膜(下层)组成,该膜位于MOSD过量生长的掺Mg的BST基膜(上层)的基础上。本发明的材料设计及其组合的膜生长制造方法能够实现有益的关键材料/器件特性,包括增强的介电常数和低损耗。漏电流密度低;高压击穿强度;高可调性受控和优化的薄膜微观结构;以及具有最小表面缺陷的光滑表面形态。本发明实现了用于RF /微波通信,雷达和电子战应用的微型高度(电压)可调频率捷变设备和/或电荷介导的压控磁性设备。

著录项

  • 公开/公告号US9506153B2

    专利类型

  • 公开/公告日2016-11-29

    原文格式PDF

  • 申请/专利权人 U.S. ARMY RESEARCH LABORATORY ATTN: RDRL-LOC-I;

    申请/专利号US201414488771

  • 发明设计人 MELANIE WILL-COLE;

    申请日2014-09-17

  • 分类号H01L21/02;C23C28/04;C23C14/34;C23C14/08;C04B41/50;

  • 国家 US

  • 入库时间 2022-08-21 13:41:22

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