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HOLDING DEVICE, AND HIGH-SPEED PLATING DEVICE PROVIDED WITH SAME.
HOLDING DEVICE, AND HIGH-SPEED PLATING DEVICE PROVIDED WITH SAME.
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机译:同时提供的保持设备和高速电镀设备。
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摘要
Provided is a holding device capable of holding a plurality of types of workpieces, and definitively preventing the leakage of the solution in a solution tank. A holding device (40) is equipped with a holding member (41) for holding an article (workpiece) (1) to be plated, which is positioned so as to extend between a solution tank through which a plating solution (liquid) flows and a holding chamber (45) that is connected to the solution tank, in the holding chamber (45). The holding member (41) has a plurality of contact parts (43) comprising chemically resistant sponge sheets (elastic bodies) (46) for sandwiching and holding the article (workpiece) (1) to be plated by contacting, with no gap interposed therebetween, the same outer-circumferential surface of the article (workpiece) (1) to be plated. Furthermore, a pressurizing device (50) is provided for pressurizing the interior of the holding chamber (45) by blowing air therein while the article (workpiece) (1) to be plated is sandwiched and held by the holding member (41).
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