SUPPRESSION FILTER, RADIATION COLLECTOR AND RADIATION SOURCE FOR A LITHOGRAPHIC APPARATUS; METHOD OF DETERMINING A SEPARATION DISTANCE BETWEEN AT LEAST TWO REFLECTIVE SURFACE LEVELS OF A SUPPRESSION FILTER

摘要

Disclosed is a suppression filter having a profile defining at least two reflective surface levels, each reflected surface level being separated by a separation distance. The separation distance is such that the reflective suppression filter is operable to substantially prevent specular reflection of radiation at a first wavelength and at a second wavelength incident on said reflective suppression filter. Also disclosed is a radiation collector, radiation source and lithographic apparatus comprising such a suppression filter, and to a method of determining a separation distance between at least two reflective surface levels of a suppression filter.