首页> 外国专利> REAL-TIME ANALYSIS AND CONTROL OF ELECTRON BEAM MANUFACTURING PROCESS THROUGH X-RAY COMPUTED TOMOGRAPHY

REAL-TIME ANALYSIS AND CONTROL OF ELECTRON BEAM MANUFACTURING PROCESS THROUGH X-RAY COMPUTED TOMOGRAPHY

机译:X射线计算机断层摄影术对电子束制造过程的实时分析与控制

摘要

Electron beam manufacturing processes, and systems that perform the processes, are described that utilize real-time analysis and control of the electron beam manufacturing processes by detecting secondary x-rays that are generated as a result of the electron beam contacting a workpiece. The detected secondary x-rays are used to generate, in real-time, a three-dimensional cross-sectional image of the portion or region of the workpiece surrounding the location contacted by the electron beam. In addition, real-time analysis of the three- dimensional cross-sectional image can be used to detect defects and real-time re-work or correction of defects can be performed by directing an electron beam back to an area with a defect.
机译:描述了电子束制造过程和执行该过程的系统,其通过检测由于电子束接触工件而产生的二次X射线,利用电子束制造过程的实时分析和控制。所检测的二次X射线用于实时产生围绕电子束接触的位置的工件的部分或区域的三维横截面图像。另外,可以使用三维横截面图像的实时分析来检测缺陷,并且可以通过将电子束引回到缺陷区域来进行实时返工或缺陷校正。

著录项

  • 公开/公告号WO2017015115A1

    专利类型

  • 公开/公告日2017-01-26

    原文格式PDF

  • 申请/专利权人 LOCKHEED MARTIN CORPORATION;

    申请/专利号WO2016US42506

  • 发明设计人 MITCHELL STEVEN WYLIE;

    申请日2016-07-15

  • 分类号H01J37/304;H01J37/305;H01J37/30;G06T11;

  • 国家 WO

  • 入库时间 2022-08-21 13:32:30

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