首页> 外国专利> SUPERHYDROPHOBIC MOLD, MANUFACTURING METHOD THEREOF, SUPERHYDROPHOBIC MATERIAL USING SUPERHYDROPHOBIC MOLD, AND MANUFACTURING METHOD THEREOF

SUPERHYDROPHOBIC MOLD, MANUFACTURING METHOD THEREOF, SUPERHYDROPHOBIC MATERIAL USING SUPERHYDROPHOBIC MOLD, AND MANUFACTURING METHOD THEREOF

机译:超疏水性模具,其制造方法,使用超疏水性模具的超疏水性材料及其制造方法

摘要

The present invention relates to a method for manufacturing a superhydrophobic mold, a superhydrophobic material using a superhydrophobic mold, and a method for manufacturing the same, the method comprising the steps of: bonding a photoresist to a metal surface for a mold; exposing the photoresist to light through lithography to form a photosensitive micropattern; forming a first anodized layer on the photosensitive micropattern through anodic oxidation; etching and removing the first anodization layer to form an anodized micropattern including a nanoseed, which is recessed deeper than the photosensitive micropattern; forming a second anodization layer including an anodized nanopattern on the anodized micropattern including a nanoseed through anodic oxidation; and etching the anodized nanopattern formed of nanopores to adjust the diameter and dent depth of the nanopores. As a result, the etching process and the anodic oxidation process are not performed in order to obtain an anodized micropattern, so that the process can be simplified. Thus, the manufacturing cost and the manufacturing time can be reduced. Also, the anodic oxidation maintains a bonding force between the photoresist and the metal, and the micropattern depth can be increased by controlling the anodization time.
机译:本发明涉及一种超疏水性模具的制造方法,使用该超疏水性模具的超疏水性材料及其制造方法,该方法包括以下步骤:将光致抗蚀剂粘合到用于模具的金属表面上;通过光刻使光致抗蚀剂曝光以形成光敏微图案;通过阳极氧化在光敏微图案上形成第一阳极氧化层;蚀刻并去除第一阳极氧化层以形成包括纳米种子的阳极氧化微图案,该纳米种子凹入的深度比光敏微图案的深。通过阳极氧化在包括纳米种子的阳极氧化微图案上形成包括阳极氧化纳米图案的第二阳极氧化层;蚀刻由纳米孔形成的阳极氧化纳米图案以调节纳米孔的直径和凹痕深度。结果,不执行蚀刻工艺和阳极氧化工艺以获得阳极化的微图案,因此可以简化工艺。因此,可以降低制造成本和制造时间。而且,阳极氧化维持光致抗蚀剂和金属之间的键合力,并且可以通过控制阳极氧化时间来增加微图案深度。

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